Plasma processing apparatus

A plasma processing apparatus, comprising:

• a processing chamber having a plasma processing space in which plasma is generated, the processing chamber being configured by a plurality of members;
• and
• a substrate support configured to support a substrate inside the processing chamber, the substrate support being configured by a plurality of members differing from the plurality of members included in the processing chamber, wherein
• the processing chamber and the substrate support, the processing chamber, or the substrate support has a plurality of boundaries at which the plurality of members are connected to each other, and
• the plurality of boundaries are provided with
• one or more radical blockers configured to block radicals generated in the plasma processing space;
• and
• one or more sealing portions configured to block passage of gas and provided at a position farther from the plasma processing space than the one or more radical blockers.