Imprint apparatus, imprint method, exposure apparatus, and manufacturing method of article

An exposure apparatus configured to transfer a pattern of an original onto each of a plurality of regions of a substrate by exposing the substrate, the exposure apparatus comprising:

• a driving unit configured to drive the substrate, on which an alignment mark has been formed and a curable composition has been coated on a surface, to align the substrate with the original based on the pattern;
• a projection optical system configured to project the pattern of the original onto the substrate;
• and
• a restricting unit configured to restrict projection from the projection optical system to a portion other than the alignment-mark portion.

An imprint method for forming, by use of a mold, a pattern of a curable composition on a substrate, the method comprising:

• applying the curable composition to the substrate on which a first alignment mark has been formed;
• driving at least one of the mold on which a second alignment mark has been formed and the substrate;
• irradiating light for curing the curable composition to form the pattern;
• and
• applying the curable composition to the first alignment-mark portion after irradiation of the light, restricting an irradiation range of the light to the first alignment-mark portion, and irradiating the light, to form a protection pattern that protects the first alignment mark.