Bandpass filter, optical structure including the same, and manufacturing method thereof

An optical structure, comprising:

• a sensor layer;
• and
• a bandpass filter disposed on the sensor layer, wherein the bandpass filter comprises:
• a first reflector layer having a reflection rate of 60-99.99% in a wavelength range of 400-700 nm, 700-1100 nm, or 1100-3400 nm;
• a second reflector layer disposed on the first reflector layer, wherein the second reflector layer has a reflection rate of 60-99.99% in a wavelength range of 400-700 nm, 700-1100 nm, or 1100-3400 nm;
• and
• a space layer disposed between the first reflector layer and the second reflector layer in a first direction,
• wherein the space layer comprises a plurality of microstructures comprising a first material, and a base layer surrounding the plurality of microstructures and comprising a base material having a refractive index that is different from the refractive index of the first material.

A manufacturing method of a bandpass filter, comprising:

• forming a first reflector layer having a reflection rate of 60-99.99% in a wavelength range of 400-700 nm, 700-1100 nm, or 1100-3400 nm;
• forming a base layer comprising a plurality of openings through the base layer and/or a plurality of recesses in the base layer on the first reflector layer;
• forming a plurality of microstructures in each of the plurality of openings and/or the plurality of recesses to form a space layer;
• and
• forming a second reflector layer on the space layer, wherein the second reflector layer has a reflection rate of 60-99.99% in a wavelength range of 400-700 nm, 700-1100 nm, or 1100-3400 nm,
• wherein the space layer comprises the plurality of microstructures and the base layer surrounding the plurality of microstructures, the plurality of microstructures comprises a first material having a refractive index, and the base layer comprises a base material having a refractive index that is different from the refractive index of the first material.