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US 2026/0168962 A1Published application
Apparatus and methods for detecting impurities in semiconductor processing tools
OwnerMing Da YANG, Chun-Hsuan LIN +2inventors
InventorsMing Da YANG, Chun-Hsuan LIN, Kuo-Lun TUNG, Yi-Chen LI
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Abstract
Embodiments of the present disclosure relate to apparatus and methods for detecting impurities in semiconductor processing tools in real time. The real time electromagnetic impedance and resonance frequency behavior detection/analysis can provide specific ion/particle/chemical information and/or fingerprint in the semiconductor process.
Claims20
An apparatus, comprising:
- a detection module comprising:
- a housing defining a testing volume configured to receive a component of a process tool;
- a coil assembly disposed on the housing and around the testing volume;
- and
- a magnet assembly positioned to impose a magnetic field in the testing volume;
- an analyzing module electrically connected to the coil assembly, wherein the analyzing module is operable to supply a pulsed radio frequency wave to the coil assembly and detect at least one of inductance, capacitance, and resistance of the detection module.
3 more elements
A system, comprising:
- a process tool;
- a process chemical source;
- a fluid passage connected between the process tool and the process chemical source;
- and
- an impurity monitoring apparatus disposed between the process tool and the process chemical source, wherein the impurity monitoring apparatus comprises:
- a housing disposed around a portion of the fluid passage;
- a coil assembly disposed on the housing;
- and
- a magnet assembly disposed around the portion of the fluid passage.
6 more elements
A method, comprising:
- supplying a fluid from a process chemical source to a process tool via a fluid passage;
- applying a base magnetic field to a portion of the fluid passage;
- applying a pulsed electromagnetic field to the portion of the fluid passage while the base magnetic field is applied on the portion of the fluid passage;
- after termination of the pulsed electromagnetic field, measuring impedance of the portion of the fluid passage;
- and
- determining impurities in the portion of fluid passage from the measured impedance.
3 more elements
Dependencies are inferred from the claim text.