Semiconductor measuring device using polychromatic light and monochromatic light

A semiconductor measuring device comprising:

• a first light source configured to output a polychromatic light;
• a second light source configured to output a monochromatic light;
• a first polarizer on an optical path through which the polychromatic light is transmitted, and configured to transmit a first polarization component of the polychromatic light along a specific direction;
• a second polarizer disposed on an optical path through which the monochromatic light is transmitted, and configured to transmit a second polarization component of the monochromatic light along a direction being perpendicular to the specific direction;
• a first beam splitter configured to separate each of the polychromatic light and the monochromatic light toward a measurement target and a reference mirror;
• a first camera configured to receive a first interference pattern between a first polychromatic reflected light resulting from a reflection of the polychromatic light off the measurement target and a second polychromatic reflected light resulting from a reflection of the polychromatic light off the reference mirror;
• a second camera configured to receive a second interference pattern between a first monochromatic reflected light resulting from a reflection of the monochromatic light off the measurement target and a second monochromatic reflected light resulting from a reflection of the monochromatic light off the reference mirror;
• and
• a controller configured to determine a height value of the measurement target, based on the first interference pattern and the second interference pattern.

A semiconductor measuring device comprising:

• a first light source configured to output a polychromatic light having a wavelength range;
• a second light source configured to output a monochromatic light having a wavelength deviating from the wavelength range by a threshold value or more;
• a first beam splitter configured to separate each of the polychromatic light and the monochromatic light toward a measurement target and a reference mirror;
• a first camera configured to receive a first interference pattern between a first polychromatic reflected light resulting from a reflection of the polychromatic light off the measurement target and a second polychromatic reflected light resulting from a reflection of the polychromatic light off the reference mirror;
• a second camera configured to receive a second interference pattern between a first monochromatic reflected light resulting from a reflection of the monochromatic light off the measurement target and a second monochromatic reflected light resulting from a reflection of the monochromatic light off the reference mirror;
• and
• a controller configured to determine a height value of the measurement target, based on a distance between the first beam splitter and the reference mirror, the first interference pattern, and the second interference pattern.