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US 2026/0168084 A1Published application
Method of depositing molybdenum-containing material on a surface
AssigneeASM IP Holding B.V.
InventorsJan Willem Maes, Chiyu Zhu, Sukanya Datta, Sivaranjani Arumugam, Hideaki Fukuda, Mathieu Patrice Diers
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Abstract
Methods and systems of depositing molybdenum-containing material are disclosed. Exemplary methods can be used to form structures that include a conductive contact, a barrier layer, and/or a spacer using the deposited molybdenum-containing material.
Claims26
A method of filling a recess on a surface of a substrate with a molybdenum-containing material comprising:
- providing a substrate in a reactor;
- and
- forming a molybdenum-containing film by repeating a cycle comprising:
- supplying a first source gas comprising a molybdenum to the substrate;
- supplying a first reactant to the substrate;
- and
- applying a first power to the reactor to form a plasma to form activated reactant species that react with the first source gas or a derivative thereof adsorbed on the substrate,
- wherein the steps of supplying the first reactant and applying the first plasma power overlap in time.
5 more elements
26-49. (canceled)
Dependencies are inferred from the claim text.