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US 2026/0167912 A1Published application
Multiwell cell culture sample plates with reduced depth
AssigneeCorning Incorporated
InventorsFeng Li, Gregory Roger Martin, Sweta Nimesh Parikh, Hilary Anne Sherman
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Abstract
A multiwell plates for cell culture growth are disclosed having reduced maximum depths. The multiwell plates may further comprise a reduced skirt height.
Claims9
A multiwell sample plate, comprising:
- a skirt comprising a bottom edge and an upper edge extending around a periphery of the skirt;
- a plurality of sample wells positioned within a boundary of the skirt, each sample well comprising a side wall, a bottom wall, and a maximum depth defined between an upper edge of the sample well and an inside surface of the bottom wall;
- supporting structure attached to and extending between the side walls of adjacent sample wells and connecting at least one sample well of the plurality of sample wells to the skirt;
- and
- wherein a distance between the upper edge of each sample well and a plane defined by the upper edge of the skirt is equal to or less than about 5 mm and the maximum depth of each sample well is less than about 1.8 cm.
2 more elements
Dependencies are inferred from the claim text.