A plasma processing system with a gas recycling system
AssigneeLam Research Corporation
InventorsLuc ALBAREDE, Alexander Miller PATERSON, Richard A. MARSH
Life of this patent
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Abstract
A gas recycling system attachable to a semiconductor processing chamber is provided. A membrane filtering system is in fluid connection with the semiconductor processing chamber, the membrane filtering system comprising at least one gas separation membrane, wherein the at least one gas separation membrane filters a pressurized exhaust gas from the semiconduct or processing chamber to separate at least one gas from the pressurized exhaust gas.
Claims23
A gas recycling system attachable to a semiconductor processing chamber, the gas recycling system comprising:
- a membrane filtering system in fluid connection with the semiconductor processing chamber comprising at least one gas separation membrane, wherein the at least one gas separation membrane filters a pressurized exhaust gas from the semiconductor processing chamber to separate at least one gas from the pressurized exhaust gas.
An apparatus for processing a substrate, comprising:
- a processing chamber for processing a substrate;
- a gas inlet for providing a gas into the processing chamber;
- a gas source for providing the gas to the gas inlet;
- an exhaust pump for pumping exhaust gas from the processing chamber;
- and
- a membrane filtering system adapted to receive exhaust gas from the exhaust pump, wherein the membrane filtering system comprises at least one gas separation membrane, wherein the at least one gas separation membrane filters the exhaust gas to separate at least one gas from the exhaust gas.
A method for processing a substrate in a semiconductor processing chamber, comprising:
- providing a gas from a gas source to the semiconductor processing chamber;
- pumping an exhaust gas out of the semiconductor processing chamber through an exhaust pump to a membrane filtering system comprising at least one gas separation membrane;
- and
- separating at least one gas from the exhaust gas using at least one gas separation membrane.
Dependencies are inferred from the claim text.