System of processing substrate, transfer method, transfer program, and holder
AssigneeTokyo Electron Limited
InventorsMasahiro NUMAKURA, Toshiaki TOYOMAKI, Seiichi KAISE, Yuki TAKEYAMA
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AssigneeTokyo Electron Limited
InventorsMasahiro NUMAKURA, Toshiaki TOYOMAKI, Seiichi KAISE, Yuki TAKEYAMA
Estimating the term…
A substrate processing system including an atmospheric-pressure transfer chamber in which a substrate and a consumable are transferred under an atmospheric-pressure atmosphere; vacuum processing chambers for processing the substrate; a vacuum transfer chamber in which the substrate and the consumable are transferred under a reduced-pressure atmosphere; at least one load lock module between the atmospheric-pressure transfer chamber and the vacuum transfer chamber, through which the transferred substrate and consumable can pass; load ports located in the atmospheric-pressure transfer chamber, wherein each of the load ports has a port through which the substrate or consumable, transferred between the atmospheric-pressure transfer chamber and a respective one containers that store the substrate or consumable, is capable of passing, and each of the containers is detachably attachable to the load port; a first transfer structure for transferring the substrate and consumable between the at least one load lock module and the vacuum processing chamber.
1-22. (canceled)
A substrate processing system comprising:
Dependencies are inferred from the claim text.