Back to results
US 2026/0165049 A1Published application
Ion implantation processing system
AssigneeRohm Co., Ltd.
InventorsYuki NAKANO, Kenji YAMAMOTO
Life of this patent
Estimating the term…
Abstract
In an ion implantation processing system including an ion implantation device, the ion implantation device acquires, from a server, off-angle data of a wafer that is an ion implantation processing target and controls an ion implantation angle with respect to the wafer based on the off-angle data.
Claims20
An ion implantation processing system comprising an ion implantation device,
- wherein the ion implantation device acquires, from a server, off-angle data of a wafer that is an ion implantation processing target and controls an ion implantation angle with respect to the wafer based on the off-angle data.
Dependencies are inferred from the claim text.