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US 2026/0164647 A1Published application
Semiconductor structure including a capacitor structure and method of manufacturing the same
AssigneeNanya Technology Corporation
InventorYING-CHENG CHUANG
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Abstract
A semiconductor structure and a method of manufacturing the same are provided. The semiconductor structure includes a base structure, a patterned circuit structure, a capacitor structure and a vertical transistor. The patterned circuit structure is disposed over the base structure. The capacitor structure is disposed over the patterned circuit structure. The vertical transistor is disposed over the capacitor structure.
Claims20
A semiconductor structure, comprising:
- a base structure;
- a patterned circuit structure disposed over the base structure;
- a capacitor structure disposed over the patterned circuit structure;
- and
- a vertical transistor disposed over the capacitor structure.
2 more elements
Dependencies are inferred from the claim text.