Plasma processing apparatus and plasma processing method

A plasma processing method using a plasma processing apparatus including a processing chamber configured to allow a sample to be plasma-processed, a radio frequency power supply configured to supply radio frequency power of microwave for generating plasma, a plurality of coils configured to form a magnetic field in the processing chamber, a coil power supply configured to cause a current to flow through each of the coils, and a sample stage configured to allow the sample to be placed, the plasma processing method comprising:

• a step of receiving information on a shape of an isomagnetic surface having a magnetic flux density for causing cyclotron resonance of a charged particle by interaction with the microwave;
• a step of obtaining combinations of current values for forming the received shape of the isomagnetic surface based on a correlation between values of the currents and the shape of the isomagnetic surface;
• a step of obtaining one desired combination of current values from the obtained combinations of current values based on a coil current selection reference;
• and
• a step of controlling the coil power supply to cause each current in the obtained desired combination of current values to flow.