Low-impedance, high-current coaxial line for a plasma process supply system, plasma process system, and method for operating a plasma process system

Abstract

A low-impedance, high-current coaxial line for a plasma process system includes a tubular thermally conductive electric insulator; an electric outer conductor which is arranged on the insulator in the form of an outer layer; and an electric inner conductor which is arranged in the insulator in the form of an inner layer. The inner and outer diameters of the insulator are dimensioned such that the insulator is configured to have a line impedance of ≤20Ω. The low-impedance, high-current coaxial line is configured to connect to an impedance adaptation circuit and a plasma process assembly. The low-impedance, high-current coaxial line is configured to supply the plasma process assembly with high frequency (HF) power by means of an HF power supply.

Dependencies are inferred from the claim text.