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US 2026/0159982 A1Published application
Electroplating system with low angle membrane
AssigneeLam Research Corporation
InventorsFrederick Dean WILMOT, Robert RASH, Nirmal Shankar SIGAMANI, Gabriel GRAHAM
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Abstract
An electroplating system to process a substrate includes clamps and a membrane. The membrane is held by the clamps and separates a first portion of a chamber of the electroplating system from a second portion of the chamber. The membrane includes a surface extending from a center of a cavity of the chamber radially outward at an angle relative to a reference plane. The angle is greater than or equal to 0° and less than or equal to 3°.
Claims22
An electroplating system to process a substrate, the electroplating system comprising:
- a plurality of clamps;
- and
- a membrane held by the plurality of clamps and separating a first portion of a chamber of the electroplating system from a second portion of the chamber, wherein the membrane comprises a surface extending from a center of a cavity of the chamber radially outward at an angle relative to a reference plane, and wherein the angle is greater than or equal to 0° and less than or equal to 3°.
Dependencies are inferred from the claim text.