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US 2026/0159955 A1Published application
Wet processing device with gas-liquid mixing
AssigneeYield Engineering Systems, Inc.
InventorsRajeev Bajaj, Christopher Lane, Deepak Pandey, Purnima Narayanan
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Abstract
An apparatus for wet chemical processing of multiple substrates consists of a processing tank that supports these substrates. Positioned within this tank, s flow plate is situated below the substrates when they are in place. This flow plate features numerous orifices that are configured to discharge a liquid solution containing a dispersion of gas bubbles towards the substrates.
Claims16
An apparatus for wet chemical processing of a plurality of substrates, comprising:
- a processing tank configured to support the plurality of substrates;
- and
- a flow plate disposed in the processing tank such that, when the plurality of substrates are supported in the processing tank, the flow plate is positioned below the plurality of substrates, wherein the flow plate includes a plurality of orifices configured to discharge a liquid solution having a dispersion of gas bubbles therein towards the plurality of substrates.
A method of wet chemical processing a plurality of substrates, comprising:
- positioning a plurality of substrates in a processing tank;
- directing a liquid solution having a dispersion of gas bubbles therein through a plurality of orifices of a flow plate positioned below the plurality of substrates;
- and
- conveying the liquid solution exiting the processing tank to a cavitation device;
- replenishing the liquid solution with gas bubbles in the cavitation device;
- and
- recirculating the replenished liquid solution to the processing tank through the plurality of orifices of the flow plate.
4 more elements
Dependencies are inferred from the claim text.