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US 2026/0159946 A1Published application
High purity alkynyl amines for selective deposition
AssigneeVersum Materials US, LLC
InventorsSERGEI V. IVANOV, ALAN C. COOPER
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Abstract
The disclosed and claimed subject matter relates to high purity alkynyl amines substantially free of residual halides and/or water and their use (e.g., in formulations) for enhanced passivation of metallic substrates.
Claims21
A high purity alkynyl amine having (a) a concentration of halogen-containing impurities of less than about 10 ppm and (b) a concentration of water of less than about 100 ppm.
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Dependencies are inferred from the claim text.