Bismuth precursors for euv film processes
AssigneeEntegris, Inc.
InventorsDavid M. Ermert, Claudia Fafard, Thomas M. Cameron, David Medeiros
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Abstract
Bismuth-containing precursor compositions and a method of depositing the precursor on a substrate to form a bismuth-containing film are provided. The bismuth-containing precursor is of the formula: BiL1L2L3, wherein each of L1, L2, or L3 independently is at least one of a hydrogen, an alkyl, an alkenyl, an alkynyl, an aryl, a cycloalkyl, an alkoxy, an oxysilyl, an alkoxyalkyl, an aralkyl, a thiol, a xanthate, a thioester, an amino, an amidine, a guanidine, a carbonyl, a halogen, or any combination thereof, or at least two of L1, L2, or L3 are bonded to form a cyclic ring.
Claims20
A composition comprising:
- a compound of the formula:
- wherein each of L1, L2, or L3 independently comprises:
- at least one of a hydrogen, an alkyl, an alkenyl, an alkynyl, an aryl, a cycloalkyl, an alkoxy, an oxysilyl, an alkoxyalkyl, an aralkyl, a thiol, a xanthate, a thioester, an amino, an amidine, a guanidine, a carbonyl, a halogen, or any combination thereof, or
- at least two of L1, L2, or L3 are bonded to form a cyclic ring.
A method comprising:
- obtaining a precursor compound of the formula:
- wherein each of L1, L2, or L3 independently comprises:
- at least one of a hydrogen, an alkyl, an alkenyl, an alkynyl, an aryl, a cycloalkyl, an alkoxy, an oxysilyl, an alkoxyalkyl, an aralkyl, a thiol, a xanthate, a thioester, an amino, an amidine, a guanidine, a carbonyl, a halogen, or any combination thereof, or
- at least two of L1, L2, or L3 are bonded to form a cyclic ring;
- heating the precursor compound to form a precursor vapor;
- and
- contacting a substrate with the precursor compound to form a film on the substrate.
Dependencies are inferred from the claim text.