Semiconductor processing tool and methods of operation
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorYen-Liang LIN
Life of this patent
Estimating the term…
Abstract
Some implementations herein provide a PVD tool that includes a rotational magnet system configured to generate a magnetic field in a processing chamber of the PVD tool. The magnetic field may be used to control the distribution and/or flow of material from a target structure in the processing chamber to a semiconductor substrate in the processing chamber. The rotational magnet system includes a spiral pattern of magnetic pillars on a disc structure. The quantity, spacing, and/or arrangement of the magnetic pillars in the spiral pattern are configured to reduce the likelihood of formation of hot spots in the electromagnetic field in the processing chamber.
Claims20
A deposition tool, comprising:
- a pedestal component;
- and
- a rotational magnet system comprising:
- a first curved segment of first vertically-arranged magnetic pillars having a first average radial spacing,
- wherein the first curved segment is located above a first perimeter region of a disc structure;
- a second curved segment of second vertically-arranged magnetic pillars having a second average radial spacing, less than the first average radial spacing,
- wherein the second curved segment is located above a second perimeter region of the disc structure;
- and
- a third curved segment of third vertically-arranged magnetic pillars having a third average radial spacing, less than the first average radial spacing and the second average radial spacing,
- wherein the third curved segment is located above a third perimeter region of the disc structure.
A method, comprising:
- receiving, onto a pedestal component, a semiconductor substrate;
- generating, over the semiconductor substrate, an electromagnetic field using a rotational magnet system,
- wherein the rotational magnet system includes:
- a first curved segment that is located on a perimeter region of a disc structure and includes a first set of magnetic components with a first average radial spacing;
- a second curved segment that is located on the perimeter region of the disc structure and includes a second set of magnetic components with a second average radial spacing that is less than the first average radial spacing;
- and
- a third curved segment that is located on the perimeter region of the disc structure and includes a third set of magnetic components with a third average radial spacing that is less than the first average radial spacing and less than the second average radial spacing;
- and
- performing a deposition operation to deposit a material onto the semiconductor substrate using the electromagnetic field.
A method, comprising:
- generating, over a semiconductor substrate, an electromagnetic field using a rotational magnet system,
- wherein the rotational magnet system includes:
- a first plurality of magnetic components arranged at a first average spacing along a first curved portion of a magnet fixture;
- a second plurality of magnetic components arranged at a second average spacing along a second curved portion of the magnet fixture;
- and
- a third plurality of magnetic components arranged at a third average spacing along a third curved portion of the magnet fixture;
- and
- performing a deposition operation to deposit a material onto the semiconductor substrate using the electromagnetic field.
Dependencies are inferred from the claim text.