Thin film characteristic diagnosis device and thin film characteristic diagnosis method

Abstract

A thin film characteristic diagnosis device according to an embodiment includes: a memory storing at least one instruction; and at least one processor executing the at least one instruction, wherein the at least one processor is configured to: make laser (light amplification by simulated emission of radiation; LASER) light, which supplies energy to a thin film, be incident onto the thin film; determine an ordinary refractive index (no) of the thin film based on a first spectrum obtained by polarizing emission light that has passed through a Fourier lens after being emitted from the thin film according to a first polarization plane; and determine a transition dipole moment (TDM) orientation angle (θhor) and an extraordinary refractive index (ne) of the thin film based on the first spectrum and a second spectrum obtained by polarizing the emission light according to a second polarization plane perpendicular to the first polarization plane.

Dependencies are inferred from the claim text.