System and Method For a Spatially-resolved Thin Film Linear Deposition
OwnerJehad Abushamainventor
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Abstract
A vapor-deposition system is provided including one or more precursor chambers configured to deliver precursor material to a plurality of crucibles under vacuum conditions. Each crucible is independently heated to a controlled temperature to generate a vaporized precursor stream that is conveyed through a corresponding transfer tube and manifold to a nozzle array positioned above a substrate. Certain embodiments employ a single precursor chamber and multiple crucibles connected through a distribution assembly, while other embodiments include multiple manifolds arranged in parallel above the substrate. The system enables coordinated co-deposition of metallic, chalcogen, and dopant materials to form composition-controlled thin films with high spatial uniformity.
Claims20
1) A vapor deposition system comprising:
- a feed-in subsystem configured to deliver precursor material to a crucible under vacuum conditions, the feed-in subsystem including a feed-in chamber, a high-temperature valve, and a feed-in tube forming a vapor-tight connection to the crucible;
- the crucible disposed within a crucible housing and configured to vaporize the precursor material;
- a transfer-tube and manifold assembly fluidly coupled to the crucible;
- and
- a nozzle array coupled to the manifold and configured to direct vaporized precursor material toward a substrate.
Dependencies are inferred from the claim text.