Composite material, working stamp, and preparation method thereof
AssigneesInterface Advanced Technology (Chengdu) Co., Ltd., Interface Technology (ChengDu) Co., Ltd., Interface Optoelectronics (Shenzhen) Co., Ltd., General Interface Solution Limited
InventorsJIA-GUEI YANG, CHIH-PENG CHANG
Life of this patent
Estimating the term…
Abstract
Embodiments of the present disclosure relates to a composite material, a working stamp, and a preparation method thereof. The composite material includes a polymer matrix, a plurality of SMA nanoparticles, and a plurality of NTE material nanoparticles. The SMA nanoparticles are dispersed in the polymer matrix. The NTE material nanoparticles are dispersed in the polymer matrix. At a first temperature, the composite material is in a cured state and a thermal expansion coefficient of the composite material is zero (0) or near zero. When the composite material is cooled from the first temperature to a second temperature, the composite material spontaneously contracts caused by phase transformation of the SMA nanoparticles.
Claims20
A composite material designed for making a working stamp in nanoimprint technology, comprising:
- a polymer matrix;
- a plurality of shape memory alloy (SMA) nanoparticles dispersed within the polymer matrix;
- and
- a plurality of negative thermal expansion (NTE) material nanoparticles dispersed within the polymer matrix;
- wherein at a first temperature, the composite material is in a cured state and a thermal expansion coefficient of the composite material is zero (0) or near zero;
- and
- upon cooling from the first temperature to a second temperature, the composite material spontaneously contracts caused by a phase transformation of the SMA nanoparticles.
A working stamp configured for nanoimprint lithography, comprising:
- an imprint layer having an imprint pattern;
- wherein the imprint layer comprises a composite material comprising:
- a polymer matrix;
- a plurality of shape memory alloy (SMA) nanoparticles dispersed within the polymer matrix;
- and
- a plurality of negative thermal expansion (NTE) material nanoparticles dispersed within the polymer matrix;
- wherein the imprint layer is configured to spontaneous contracts caused by a phase transformation of the SMA nanoparticles when exposed to a temperature in a range of 20° C. to 30° C.
A method of preparing a working stamp for nanoimprint lithography, comprising:
- applying a composite material in liquid form onto a master mold having an original pattern;
- wherein the composite material comprises a polymer matrix;
- a plurality of shape memory alloy (SMA) nanoparticles dispersed within the polymer matrix;
- and a plurality of negative thermal expansion material (NTE) nanoparticles dispersed within the polymer matrix;
- curing the composite material at a first temperature to form an imprint layer comprising an imprint pattern inverse to the original pattern, wherein a thermal expansion coefficient of the composite material is zero (0) or near zero at the first temperature;
- and
- demolding the working stamp from the master mold by cooling to a second temperature lower than the first temperature, wherein the composite material spontaneously contracts caused by a phase transformation of the SMA nanoparticles.
Dependencies are inferred from the claim text.