High Power 193 Nanometer Continuous-Wave Laser Light

A method comprising:

• generating first continuous-wave (CW) light at a first power level having a deep-ultraviolet (DUV) wavelength in a range between 250 nm and 275 nm;
• generating second CW light at a second power level having an infrared (IR) wavelength in a range between 1300 nm and 1700 nm;
• and
• enhancing the second CW light to produce enhanced CW light having the IR wavelength and a third power level that is greater than the second power level;
• mixing the first CW light and a first portion of the enhanced CW light to generate sum-frequency generation (SFG) light;
• and
• mixing the SFG light and a second portion of the enhanced CW light to generate CW output light having an output wavelength in a range between 180 nm and 200 nm.

An inspection system configured to inspect a sample, the inspection system comprising:

• a laser assembly configured to generate continuous-wave (CW) output light;
• first optics configured to direct the CW output light from the laser assembly to the sample;
• second optics configured to collect light from the sample;
• a detector configured to convert the collected light into a corresponding signal;
• and
• a computer system configured to analyze the signal,
• wherein the laser assembly comprises:
• a first laser light source configured to generate first CW light at a first power level and a first deep-ultraviolet (DUV) frequency having a first DUV wavelength in a range between 250 nm and 275 nm;
• a second laser light source configured to generate second CW light at a second power level and an infrared (IR) frequency having an IR wavelength in a range between 1300 nm and 1700 nm;
• at least one resonant cavity configured to enhance the second CW light received from the second laser light source such that the enhanced CW light has a third power level that is greater than the second power level;
• a first non-linear optical (NLO) crystal configured to generate a sum-frequency generation (SFG) light at a second DUV frequency by mixing the first CW light and a first portion of the enhanced CW light;
• and
• a second NLO crystal configured to generate said CW output light at a third DUV frequency having a corresponding third DUV wavelength in a range between 180 nm and 200 nm by mixing the SFG light and a second portion of the enhanced CW light.