Composition, resist film, pattern forming method, and method for producing electronic device

A composition comprising:

• a compound A having a plurality of groups that are each a group represented by any one of formula (A1) to formula (A3);
• and
• a compound B having a plurality of specific functional groups that are each a specific functional group selected from the group consisting of a nitrogen-containing aromatic heterocyclic group, —NH2, an NH2 group protected with a removable protecting group, —NHRN1, an NHRN1 group protected with a removable protecting group, —NRN22, —C≡N, —OH, —ORO, —SH, —SRS, —PRP12, and —P(ORP2)2
• the composition satisfying at least one of requirement 1 or requirement 2:
• Requirement 1:
• The compound A is a polymer having a repeating unit including the group represented by any one of formula (A1) to formula (A3),
• Requirement 2:
• The compound B is a polymer having a repeating unit including the specific functional group,
• wherein RN1, RN2, RO, RS, RP1, and RP2 each independently represent a monovalent hydrocarbon group optionally having a substituent, monovalent hydrocarbon groups represented by RN2 may be bonded to each other to form a ring, monovalent hydrocarbon groups represented by RP1 may be bonded to each other to form a ring, and monovalent hydrocarbon groups represented by RP2 may be bonded to each other to form a ring,
• in formula (1,
• X represents an iodine atom, a bromine atom, or a chlorine atom,
• EWG represents an electron-withdrawing group,
• m represents an integer of 4 or more, and
• Ar represents an aromatic hydrocarbon ring optionally having a substituent,
• in formula (A2),
• X represents an iodine atom, a bromine atom, or a chlorine atom, and
• each R independently represents a hydrogen atom or a substituent, provided that at least one R represents an electron-withdrawing group,
• in formula (A3),
• X represents an iodine atom, a bromine atom, or a chlorine atom, and
• * represents a bonding position.