Method for manufacturing an electro-optical device and electro-optical device
AssigneeBlack Semiconductor GmbH
InventorsDaniel Schall, Galip Reha Hepgüler
Life of this patent
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Abstract
The present application relates to a electro-optical device manufactured by a method, wherein a waveguide (3) is provided (S1), a planarization coat (7) overlapping at least a section of the waveguide (3) is fabricated (S2), the planarization coat (7) is provided with a spin-on-glass coating (9) (S3), at least in the region of the spin-on-glass coating (9), a preferably dry chemical etching treatment is carried out (S4), optionally, the steps of providing the planarization coat (7) with a spin-on-glass coating (9) and the etching treatment are repeated at least once (S5, S6), and an active element (10) is provided (S7) on or above the planarization coat (7) and above the waveguide (3).
Claims23
An electro-optical device, in particular a photodetector (6) or electro-optical modulator (6), comprising:
- a waveguide (3),
- a planarization coat (7) formed by depositing a coating material overlaps at least a section of the waveguide (3),
- the planarization coat (7) includes a spin-on-glass coating (9),
- at least in the region of the spin-on-glass coating (9), a portion of the spin-on-glass coating (9) and the planarization coat (7) have been etched by a dry chemical etching treatment, and
- an active element (10) is positioned on or above the planarization coat (7) and above the waveguide (3), which active element (10) includes at least one material that absorbs electromagnetic radiation of at least one wavelength and generates an electric photosignal as a result of the absorption and/or whose refractive index changes as a function of a voltage and/or the presence of charge(s) and/or an electric field.
Electro-optical device (6) produced by a method comprising the following steps:
- providing a waveguide (3) (S1),
- a planarization coat (7) overlapping at least a section of the waveguide (3) is fabricated (S2), preferably by applying, in particular depositing, a coating material,
- the planarization coat (7) is provided with a spin-on-glass coating (9) (S3),
- at least in the region of the spin-on-glass coating (9), a preferably dry chemical etching treatment is carried out (S4), in the course of which etching is preferably carried out down to the planarization coat (7) and preferably the spin-on-glass
- coating (9) and part of the planarization coat (7) are removed,
- optionally, the steps of providing the planarization coat (7) with a spin-on-glass coating (9) and the etching treatment are repeated at least once (S5, S6), and
- an active element (10) is provided (S7) on or above the planarization coat (7) and above the waveguide (3), which active element (10) comprises or consists of at least one material, which absorbs electromagnetic radiation of at least one wavelength and generates an electric photosignal as a result of the absorption and/or whose refractive index changes as a function of a voltage and/or the presence of charge(s) and/or an electric field.
(10) a further active element (10) is provided, the further active element (10) preferably being arranged offset with respect to the active element (10) in such a way that the active element (10) and the further active element (10) lie one above the other in sections.
Method for manufacturing an electro-optical device, in particular a photodetector (6) or electro-optical modulator (6), wherein
- a waveguide (3) is provided (S1),
- a planarization coat (7) overlapping at least a section of the waveguide (3) is fabricated (S2), preferably by applying, in particular depositing, a coating material,
- the planarization coat (7) is provided with a spin-on-glass coating (9) (S3),
- at least in the region of the spin-on-glass coating (9), a preferably dry chemical etching treatment is carried out (S4), in the course of which etching is preferably carried out down to the planarization coat (7) and preferably the spin-on-glass coating (9) and part of the planarization coat (7) are removed,
- optionally, the steps of providing the planarization coat (7) with a spin-on-glass coating (9) and the etching treatment are repeated at least once (S5, S6), and
- an active element (10) is provided (S7) on or above the planarization coat (7) and above the waveguide (3), which active element (10) comprises or consists of at least one material, which absorbs electromagnetic radiation of at least one wavelength and generates an electric photosignal as a result of the absorption
- and/or whose refractive index changes as a function of a voltage and/or the presence of charge(s) and/or an electric field.
Dependencies are inferred from the claim text.