Powder mitigation and exhaust management for thin film deposition

A spatial atomic layer deposition (SALD) system comprising:

• a coating head including:
• a precursor gas channel configured to provide a precursor gas to a substrate;
• a reactant gas channel positioned forward of the precursor gas channel, the reactant gas channel configured to provide a reactant gas to the substrate;
• and
• a sequence of exhaust channels positioned with respect to the precursor gas channel and the reactant gas channel, each exhaust channel configured to withdraw unwanted material from a vicinity of the substrate.

A spatial atomic layer deposition (SALD) system comprising:

• a coating head including:
• a precursor gas channel configured to provide a precursor gas to a substrate;
• a reactant gas channel positioned forward of the precursor gas channel, the reactant gas channel configured to provide a reactant gas to the substrate;
• and
• an alternating sequence of inert gas channels and exhaust channels positioned with respect to the precursor gas channel and the reactant gas channel, each inert gas channel configured to provide an inert gas to the substrate to purge unwanted material from the substrate, each exhaust channel configured to withdraw unwanted material from a vicinity of the substrate.