Furnace tube and using method thereof

Abstract

A furnace tube and a using method of the same are provided. The furnace tube includes a chamber for processing a wafer; a normal-pressure gas intake device and a low-pressure gas intake device configured to supply gas to the chamber, wherein each of the normal-pressure gas intake device and the low-pressure gas intake device is independently connected to the chamber; a normal-pressure control device and a low-pressure control device configured to control an air pressure in the chamber, wherein each of the normal-pressure control device and the low-pressure control device is configured to independently control the air pressure in the chamber; and a normal-pressure gas injection pipe located inside the chamber and connected to the normal-pressure gas intake device, and a low-pressure gas injection pipe located inside the chamber and connected to the low-pressure gas intake device.

Dependencies are inferred from the claim text.