Drying apparatus and method for drying substrate using supercritical fluid

A drying apparatus for drying a substrate using supercritical fluid, comprising:

• an upper chamber and a lower chamber, the lower chamber being disposed below the upper chamber;
• a substrate tray, disposed on the lower chamber, used for carrying the substrate;
• a lifting mechanism, disposed below the lower chamber, used for driving the lower chamber to move in the vertical direction;
• a connecting assembly and a locking mechanism, the connecting assembly connecting the upper chamber and the lower chamber, the locking mechanism being used for locking or loosening the connecting assembly;
• when the lifting mechanism lifts the lower chamber to move upward, so that the lower chamber and the upper chamber are completely contacted, the locking mechanism locks the connecting assembly in the horizontal direction, and a gap is formed between the locking mechanism and the connecting assembly in the vertical direction, when the lifting mechanism withdraws from the lower chamber, the locking mechanism and the connecting assembly contact automatically in the vertical direction, and the upper chamber and the lower chamber are closed to form a sealed chamber;
• when the sealed chamber is opened, the lifting mechanism firstly lifts the lower chamber to move upward, the gap is formed between the locking mechanism and the connecting assembly in the vertical direction, and the locking mechanism loosens the connecting assembly in the horizontal direction, and the lifting mechanism lifts the lower chamber to move downward.