Sputter target magnet

A method, comprising:

• removing a plurality of fixed magnets from a magnetron of a deposition chamber;
• replacing each of the plurality of fixed magnets with respective ones of a plurality of adjustable magnets;
• vertically adjusting a position of at least one adjustable magnet of the plurality of adjustable magnets in the magnetron by adjusting a top adjustable connector on the at least one adjustable magnet and a bottom adjustable connector under the at least one adjustable magnet;
• measuring a magnetic field distribution in the deposition chamber;
• and
• comparing the measured magnetic field distribution in the deposition chamber with a target magnetic field distribution.

A method, comprising:

• vertically adjusting a position of at least one magnet of a plurality of magnets in a magnetron of a deposition chamber by adjusting an upper screw on the at least one magnet and a lower screw under the at least one magnet,
• wherein the at least one magnet comprises a cylindrical body for conducting magnet flux;
• adjusting a diameter of the cylindrical body;
• measuring a magnetic field distribution in the deposition chamber;
• and
• comparing the measured magnetic field distribution in the deposition chamber to a target magnetic field distribution.