Uv water purification system and methods
AssigneeThe Regents of the University of California
InventorsHaizhou LIU, Gongde CHEN
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Abstract
The invention provides a method for removing contaminants from an aqueous solution using ultraviolet light having a wavelength of 230 nm or less under reductive conditions.
Claims21
1-6. (canceled)
A method of removing a contaminant from a solution, which comprises:
- providing an aqueous solution that comprises a contaminant;
- conditioning the aqueous solution with the addition of a tunable chemical selected from the group consisting of H2, N2, alcohols, and carboxylic acids;
- optionally adjusting the pH of the tuned solution so that it is between about 7 and about 12;
- and
- irradiating the tuned solution with UV light having a wavelength between about 100 nm and about 230 nm until at least 75% of the contaminant is eliminated from the solution.
The method of claim 1, wherein the contaminant is an organic contaminant, a metal, a metalloid, a nutrient, an oxyanion, a fluorinated compound, a radionuclide, or a microbial contaminant.
18-41. (canceled)
A method of removing a contaminant from a solution, which comprises:
- adding to the solution a tunable chemical selected from the group consisting of N2, H2, alcohols, and carboxylic acids;
- adjusting the pH of the solution so that it is greater than 9;
- sparging the solution;
- and
- irradiating the solution with ultraviolet light having a wavelength of less than 230 nm;
- wherein:
- the irradiation is performed during the sparging;
- and
- the solution is an aqueous solution.
A method of removing a contaminant from a solution, which comprises:
- adjusting the pH of the solution so that it is greater than 9;
- sparging the solution with H2;
- and
- irradiating the solution with ultraviolet light having a wavelength of less than 230 nm;
- wherein:
- the irradiation is performed during the sparging;
- and
- the solution is an aqueous solution.
Dependencies are inferred from the claim text.