Substrate processing system, interface apparatus, and substrate processing method

A substrate processing system comprising:

• a batch-type processing part configured to collectively process a plurality of substrates;
• a loading part into which a first cassette that accommodates the plurality of substrates is loaded;
• a single-substrate-type processing part configured to process the plurality of substrates one by one;
• an interface part configured to deliver the plurality of substrates between the batch-type processing part and the single-substrate-type processing part;
• and
• an unloading part from which a second cassette that accommodates the plurality of substrates is unloaded,
• wherein the batch-type processing part includes a processing bath that stores a processing solution having a lump shape or a mist shape which is larger than a size of the plurality of substrates,
• wherein the loading part and the batch-type processing part are disposed in parallel with respect to the unloading part and the single-substrate-type processing part,
• wherein the interface part is adjacent to the batch-type processing part and the single-substrate-type processing part,
• wherein the interface part includes:
• a first transfer region including a first transfer device;
• a first transition device being adjacent to the batch-type processing part and configured to hold the plurality of substrates in a horizontal posture;
• and
• a second transition device being adjacent to the single-substrate-type processing part and configured to hold the substrate, which is transferred from the first transfer device, in the horizontal posture,
• wherein the first transfer device is configured to transfer at least one substrate between the first transition device and the second transition device, and
• wherein the first transition device, the first transfer region, and the second transition device are arranged in a row in this order.

An interface apparatus used in a substrate processing system including a loading part into which a first cassette that accommodates a plurality of substrates is loaded, a batch-type processing part configured to collectively process the plurality of substrates and including a processing bath that stores a processing solution having a lump shape or a mist shape which is larger than a size of the plurality of substrates, a single-substrate-type processing part configured to process the plurality of substrates one by one, and an unloading part from which a second cassette that accommodates the plurality of substrates is unloaded,

• the interface apparatus comprising:
• a first transfer region including a first transfer device;
• a first transition device being adjacent to the batch-type processing part and configured to hold the plurality of substrates in a horizontal posture;
• and
• a second transition device being adjacent to the single-substrate-type processing part and configured to hold the substrate, which is transferred from the first transfer device, in the horizontal posture,
• wherein the first transfer device is configured to transfer at least one substrate between the first transition device and the second transition device,
• wherein the first transition device, the first transfer region, and the second transition device are arranged in a row in this order,
• wherein the interface apparatus is adjacent to the batch-type processing part and the single-substrate-type processing part and is configured to deliver the plurality of substrates between the batch-type processing part and the single-substrate-type processing part, and
• wherein the loading part and the batch-type processing part are disposed in parallel with respect to the unloading part and the single-substrate-type processing part.

A substrate processing method using a substrate processing system including a loading part, a batch-type processing part, an interface part, a single-substrate-type processing part, and an unloading part,

• the substrate processing method comprising:
• loading a first cassette that accommodates a plurality of substrates into the loading part;
• transferring the plurality of substrates from the loading part to the batch-type processing part;
• collectively processing the plurality of substrates in the batch-type processing part;
• delivering the plurality of substrates from the batch-type processing part to the single-substrate-type processing part using the interface part;
• processing the plurality of substrates one by one in the single-substrate-type processing part;
• transferring the plurality of substrates from the single-substrate-type processing part to the unloading part;
• and
• unloading from a second cassette that accommodates the plurality of substrates,
• wherein the batch-type processing part includes a processing bath that stores a processing solution having a lump shape or a mist shape which is larger than a size of the plurality of substrates,
• wherein the loading part and the batch-type processing part are disposed in parallel with respect to the unloading part and the single-substrate-type processing part,
• wherein the interface part is adjacent to the batch-type processing part and the single-substrate-type processing part,
• wherein the interface part includes:
• a first transfer region including a first transfer device;
• a first transition device being adjacent to the batch-type processing part and configured to hold the plurality of substrates in a horizontal posture;
• and
• a second transition device being adjacent to the single-substrate-type processing part and configured to hold the substrate, which is transferred from the first transfer device, in the horizontal posture,
• wherein the first transfer device is configured to transfer at least one substrate between the first transition device and the second transition device, and
• wherein the first transition device, the first transfer region, and the second transition device are arranged in a row in this order.