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US 2026/0129933 A1Published application
Chemical vapor deposition process and coating
AssigneeSilcotek Corp.
InventorsNikolis Austin SNYDER, David A. SMITH, Lucas D. PATTERSON, James B. MATTZELA
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Abstract
Coated articles, systems incorporating the coated articles, and processes of applying the coating to form the coated articles are disclosed. The coated article a substrate and a coating on the substrate. The coating includes silicon, carbon, and hydrogen. A post-exposure water contact angle of the coating, after being exposed to ultrasonic agitation using an aqueous solution of a caustic salt, remains above 80 degrees, remains greater than 60% of a pre-exposure water contact angle, or both.
Claims20
A coated article, comprising:
- a substrate;
- a coating on the substrate;
- wherein the coating includes silicon, carbon, and hydrogen;
- wherein a post-exposure water contact angle of the coating, after being exposed to ultrasonic agitation for at least 20 minutes using an aqueous solution of a caustic salt, remains above 80 degrees, remains greater than 60% of a pre-exposure water contact angle, or both.
1 more element
A coated article, comprising:
- a substrate;
- a coating on the substrate;
- wherein the coating includes silicon, carbon, and hydrogen;
- wherein a post-exposure water contact angle of the coating, after being exposed to ultrasonic agitation at a temperature of at least 79° C. using an aqueous solution of a caustic salt, remains above 80 degrees, remains greater than 60% of a pre-exposure water contact angle, or both.
1 more element
Dependencies are inferred from the claim text.