Method for reducing aberrations of an optical element, optical element and semiconductor system

Abstract

A method for reducing aberrations of an optical element (Mi) e.g., in a lithography system includes: determining a temporal change in an optical property of the optical element (Mi), e.g., a temporal change of a surface FIGURE(P(x,y)) of a surface (24a) of a substrate (24) of the optical element (Mi), that is expected over the operational life of the optical element (Mi), with the temporal change in the optical property over the operational life (T) of the optical element (Mi) causing varying aberrations, and reducing the aberrations that vary over the operational life of the optical element (Mi) by generating an allowance, in particular a surface figure allowance (∆PV), which compensates at least a portion of the total temporal change in the optical property (P(x,y)) that is expected over the operational life.

Dependencies are inferred from the claim text.