Apparatus for treating substrate

An apparatus for treating a substrate, comprising:

• a treatment bath having a receiving space accommodating treatment liquid, and treating a plurality of substrates;
• and
• a supporting unit supporting the substrates in the treatment bath,
• wherein the supporting unit comprises:
• a support having a first supporting rod and a second supporting rod supporting end portions of the substrates in a vertical state;
• and
• a fixing plate coupled to the support and fixing the support,
• a plurality of first slots in which edges of the substrates are inserted is formed at the first supporting rod and a plurality of second slots in which edges of the substrates are inserted is formed at the second supporting rod,
• the second supporting rod comprises a top, a first side, and a second side,
• the top of the second supporting rod comprises a first height portion and a second height portion lower than the first height portion,
• the second slot is formed at the first height portion, and
• the second slot is formed at a position higher than the second height portion.

An apparatus for treating a substrate, comprising:

• a treatment bath having a receiving space accommodating treatment liquid, and treating a plurality of substrates;
• and
• a supporting unit supporting the substrates in the treatment bath,
• wherein the supporting unit comprises:
• a support having a first supporting rod and a second supporting rod supporting end portions of the substrates in a vertical state;
• a fixing plate coupled to the support and fixing the support;
• and
• a transfer robot coupled to an upper end of the fixing plate,
• a plurality of first slots in which edges of the substrates are inserted is formed at the first supporting rod and a plurality of second slots in which edges of the substrates are inserted is formed at the second supporting rod,
• each of the plurality of first slots is defined by a first side, a second side facing the first side, and a bottom,
• a front and a rear of the first slot are open toward the receiving space, and
• the bottom of the first slot comprises contact protrusions protruding upward from a lower end of the first side of the first slot and supporting lower end portions of the substrates,
• the second supporting rod comprises a top, a first side, and a second side,
• the top of the second supporting rod comprises a first height portion and a second height portion lower than the first height portion,
• the second slot is formed at the first height portion,
• the second slot is formed at a position higher than the second height portion, and
• a distance from a center of the substrate to the second supporting rod is larger than a distance from the center of the substrate to the first supporting rod when seen from above.