Substrate processing apparatus and substrate processing method

An apparatus for processing a substrate, the apparatus comprising:

• a liquid processing chamber for processing a substrate;
• a liquid supply unit for supplying a resist liquid to the substrate disposed in the liquid processing chamber;
• and
• a controller for controlling the liquid supply unit,
• wherein the liquid supply unit includes:
• a storage assembly in which the resist liquid is stored;
• a liquid supply pipe for supplying the resist liquid in the storage assembly to the liquid processing chamber;
• and
• a trap tank installed in the liquid supply pipe,
• the storage assembly includes:
• a container having an inner space;
• an outer pack disposed in the inner space and having an accommodation space;
• an inner pack which is disposed in the accommodation space and in which the resist liquid is stored;
• and
• a gas supply unit for supplying gas to an outer space of the inner pack in the accommodation space,
• the liquid supply pipe is coupled to the inner pack so that the resist liquid in the inner pack is discharged to the trap tank by gravity, and
• the controller controls the liquid supply unit so that the resist liquid in the inner pack is supplied to the liquid supply pipe by gravity when the amount of resist liquid remaining in the inner pack is greater than a set amount, and the inner pack is pressurized by the gas supply unit in addition to gravity to supply the resist liquid in the inner pack to the liquid supply pipe when the amount of resist liquid remaining in the inner pack is less than the set amount.