Polymer material-based method for removing metal film layer from surface of substrate and photolithography method

A photolithography method with removing a metal film layer from a surface of a substrate based on polymer material, comprising:

• S1, preparing a super-resolution photolithographic structure, wherein the super-resolution photolithographic structure sequentially comprises a substrate, a reflective metal film layer, a photosensitive film layer and a transmissive metal film layer from bottom to top to form a metal-dielectric-metal plasma cavity imaging structure;
• S2, exposing the photosensitive film layer in the plasma cavity imaging structure by utilizing a super-resolution photolithography;
• S3, coating a high-molecular polymer solution onto the transmissive metal film layer, and heating to cure the high-molecular polymer solution to form a polymer film;
• S4, stripping the polymer film, while simultaneously the transmissive metal film layer which is adhered to the polymer film is completely stripped without damaging the photosensitive film layer and the reflective metal film layer;
• and
• S5, performing a negative development on pattern in the photosensitive film layer by using an organic solvent, so as to obtain a super-resolution photolithographic pattern structure, wherein
• the high-molecular polymer solution comprises:
• a combination solution of a polyvinyl alcohol and a polyvinylpyrrolidone;
• or
• a combination solution of the polyvinyl alcohol and a melamine, wherein
• the polyvinyl alcohol has a polymerization degree of 500-2000 and an alcoholysis degree of 87%-89%;
• and
• the high-molecular polymer solution is determined according to a bonding force between the photosensitive film layer and the transmissive metal film layer.