Liquid ejection device and wiping device

A liquid ejection device comprising:

• a head having a nozzle surface where a nozzle that ejects a liquid is opened;
• a wiping member configured to wipe the nozzle surface;
• a reel-out unit around which the wiping member is wound;
• a wind-up unit configured to wind up the wiping member;
• a pressing unit configured to press the wiping member against the nozzle surface;
• a second curing unit configured to apply energy to the wiping member and thus cure the liquid wiped by the wiping member;
• and
• a third curing unit configured to apply energy to the wiping member and thus cure the liquid wiped by the wiping member, wherein
• the wiping member is formed of at least two layers including a first layer and a second layer that is farther from the nozzle surface than the first layer and is adjacent to the first layer,
• the first layer and the second layer are brought into a separated state in a path between the pressing unit and the wind-up unit,
• the second curing unit applies energy to the first layer at a position opposite the second layer in the separated state, with the first layer in the separated state located therebetween, and
• the third curing unit applies energy to the second layer at a position opposite the first layer in the separated state, with the second layer in the separated state located therebetween.

A wiping device comprising:

• a wiping member configured to wipe a nozzle surface where a nozzle that ejects a liquid is opened;
• a reel-out unit around which the wiping member is wound;
• a wind-up unit configured to wind up the wiping member;
• a pressing unit configured to press the wiping member against the nozzle surface;
• and
• a first curing unit configured to apply energy to the wiping member and thus cure the liquid wiped by the wiping member, wherein
• the wiping member is formed of at least two layers including a first layer and a second layer that is farther from the nozzle surface than the first layer and is adjacent to the first layer,
• the first layer and the second layer are brought into a separated state in a path between the pressing unit and the wind-up unit, and
• the first curing unit applies energy to the first layer and the second layer at a position between the first layer and the second layer in the separated state.

A wiping device comprising:

• a wiping member configured to wipe a nozzle surface where a nozzle that ejects a liquid is opened;
• a reel-out unit around which the wiping member is wound;
• a wind-up unit configured to wind up the wiping member;
• a pressing unit configured to press the wiping member against the nozzle surface;
• a second curing unit configured to apply energy to the wiping member and thus cure the liquid wiped by the wiping member;
• and
• a third curing unit configured to apply energy to the wiping member and thus cure the liquid wiped by the wiping member, wherein
• the wiping member is formed of at least two layers including a first layer and a second layer that is farther from the nozzle surface than the first layer and is adjacent to the first layer,
• the first layer and the second layer are brought into a separated state in a path between the pressing unit and the wind-up unit,
• the second curing unit applies energy to the first layer at a position opposite the second layer in the separated state, with the first layer in the separated state located therebetween, and
• the third curing unit applies energy to the second layer at a position opposite the first layer in the separated state, with the second layer in the separated state located therebetween.