Substrate processing apparatus and substrate processing method
AssigneeSemes Co., Ltd.
InventorSung Pil KIM
Life of this patent
Estimating the term…
Abstract
Provided is an apparatus for processing a substrate, the apparatus including: a liquid treating chamber for liquid-treating a substrate; and a liquid supply unit for supplying a treatment liquid to the liquid treating chamber. The liquid supply unit includes: a supply tank for storing the treatment liquid therein; a circulation line connected to the supply tank to circulate the treatment liquid; and a liquid supply line having an opening/closing valve installed and branching from the circulation line to supply the treatment liquid to the liquid treating chamber. The supply tank is provided with a first stirrer that configured to apply flow pressure to the treatment liquid in the supply tank.
Claims12
-9. (canceled)
A method of processing a substrate, the method comprising:
- an adjustment operation of adjusting a temperature and a concentration of a treatment liquid stored in a supply tank;
- and
- a liquid treatment operation of supplying the temperature and concentration adjusted treatment liquid to a liquid treating chamber through a liquid supply line branching from the circulation line, after the adjustment operation,
- wherein in the adjustment operation, the treatment liquid flows by a first stirrer installed in the supply tank while the treatment liquid is circulated.
(canceled)
Dependencies are inferred from the claim text.