Scanning Magnetron Device and Magnetron Sputtering Apparatus for PVD Planar Target

A scanning magnetron device for a Physical Vapor Deposition (PVD) planar target, comprising:

• a magnetron, comprising an outer magnetic pole and an inner magnetic pole, wherein a polarity of the outer magnetic pole facing the target is opposite to that of the inner magnetic pole also facing the target, the outer magnetic pole comprises an outer linear portion and an outer semicircular portion connected to an end part of the outer linear portion, the inner magnetic pole comprises an inner linear portion and an inner semicircular portion connected to an end part of the inner linear portion, each of two opposite sides of the inner linear portion is provided with the outer linear portion, a gap is formed between the inner linear portion and the outer linear portion, at least the outer linear portion and the inner linear portion form a linear section, at least the outer semicircular portion and the inner service Mar portion forms a semicircular section;
• a driving device, configured to drive the magnetron to reciprocate along a first direction and a second direction, wherein the first direction is perpendicular to a linear direction along which the linear section extends, and the second direction is parallel to the linear direction along which the linear section extends;
• wherein a distance L1 that the magnetron scans along the first direction satisfies:
• L12≥d, a distance L2 that the magnetron scans along the second direction satisfies:
• 0.5d≤L2≤2d, and d is a distance between center lines of the gaps on two opposite sides of the inner linear portion.