US 2026/0107727 A1 · VALVE AND CHAMBER MATCHING

Abstract

A method for providing secondary controlling parameters for controlling a secondary vacuum valve, includes generating primary controlling parameters for controlling a primary vacuum valve by providing target processing information, providing a first process chamber having the primary valve to control the in/out fluid flow, running a reference processing cycle with variation of valve closure positions of the primary valve based on the target processing information with deriving a first processing information related to the first process chamber, and adjusting the valve positions based on comparing the first and target processing information, and deriving the primary controlling parameters for the primary valve based on the derived first processing information and the related valve positions, providing a second process chamber including the secondary vacuum valve to control the in/out fluid flow, and controlling the secondary valve based on the primary controlling parameters. The primary controlling parameters are provided as secondary controlling parameters.

Claims15

Dependent claims

A method for providing secondary controlling parameters for controlling a secondary vacuum valve (10′), the method comprising:

generating primary controlling parameters for controlling a primary vacuum valve (10) by
providing a target processing information,
providing a first process chamber (1) comprising the primary vacuum valve (10) to control a fluid flow into or out of the first process chamber (1),
running a reference processing cycle with variation of valve positions of a valve closure of the primary vacuum valve (10) as a function of the target processing information with
deriving a first processing information related to the first process chamber (1), and
adjusting the valve positions based on comparing the first processing information with the target processing information, and
deriving the primary controlling parameters for the primary vacuum valve (10) based at least on the derived first processing information and the related valve positions,
providing a second process chamber (1′) comprising the secondary vacuum valve (10′) to control a fluid flow into or out of the second process chamber (1′), and
controlling the secondary vacuum valve (10′) based on the primary controlling parameters, wherein the primary controlling parameters are provided as secondary controlling parameters.

6 more elements

A method for aligning a processing performance of a first process chamber (1) with a processing performance of a second process chamber (2), the method comprising:

providing a target processing information,
providing the first process chamber (1) with a first vacuum valve (10) to control a fluid flow into or out of the first process chamber (1),
providing the second process chamber (1′) with the second vacuum valve (10′) to control a fluid flow into or out of the second process chamber (1′),
generating first controlling parameters for controlling the first vacuum valve (10) by
running a first processing cycle with variation of valve positions of a valve closure of the first vacuum valve (10) as a function of the target processing information by
deriving a first processing information related to the first process chamber (1),
adjusting the valve positions based on comparing the first processing information with the target processing information, and
deriving the first controlling parameters for the first vacuum valve (10) based at least on the derived first processing information and the related valve positions,
generating second controlling parameters for controlling the second vacuum valve (10′) by
running a second processing cycle with variation of valve positions of a valve closure of the second vacuum valve (10′) as a function of the target processing information by
deriving a second processing information related to the second process chamber (1′),
adjusting the valve positions based on comparing the second processing information with the target processing information, and
deriving the second controlling parameters for the second vacuum valve (10′) based at least on the derived second processing information and the related valve positions,
comparing the first and the second processing information, and
deriving a commonly applicable processing information based on the comparing of the first and the second processing information.

12 more elements

A controller (20,20′) for controlling at least one vacuum valve (10,10′) to control a pressure in at least one process chamber (1,1′) using the vacuum valve (10,10′), wherein the controller (20,20′) is configured to control the at least one vacuum valve (10,10′) based on respective controlling parameters assigned to the at least one vacuum valve (10,10′).

Dependencies are inferred from the claim text.

Valve and chamber matching

Life of this patent

Valve and chamber matching

Life of this patent

Abstract

Claims15