# US 2026/0100338 A1 · Bellows seal for low thru-force actuation of temperature probe across vacuum interface > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2026/0100338 A1 - Document ID: US20260100338A1 - Status: Published application - Kind: A1 - Application number: 19/113,521 - Filed: 2023-09-18 - Published: 2026-04-09 - Earliest claimed: 2022-09-23 - Assignees: Lam Research Corporation - Applicants: Lam Research Corporation - Inventors: Aris PEREZ; Scott STEVENOT; Alexander MATYUSHKIN; Adam Christopher MACE - Web page: https://patentgrep.com/patent/US20260100338A1 ## CPC - H01J 37/32513: {Sealing means, e.g. sealing between different parts of the vessel} - H10P 72/0602: {Temperature monitoring} - H01J 37/32623: {Mechanical discharge control means} - H01J 37/32642: {Focus rings} - H01J 37/32715: {Workpiece holder} - H01J 37/32724: {Temperature} - H10P 72/0441: {Apparatus for sealing, encapsulating, glassing, decapsulating or the like} - H10P 72/7624: {characterised by the mechanical construction of the susceptor, stage or support} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract An actuator assembly to actuate a plasma tuning ring in a processing chamber includes an actuator, a rod, bellows, and vacuum seals. The actuator is arranged external to the processing chamber. The processing chamber is under vacuum. The actuator is at atmospheric pressure. The rod is coupled to the actuator and to the plasma tuning ring in the processing chamber. The bellows are arranged external to the processing chamber between the actuator and the processing chamber. The rod passes through the bellows into the processing chamber. The vacuum seals are disposed between the bellows and the actuator and between the bellows and the processing chamber to seal the vacuum in the processing chamber from the atmospheric pressure external to the processing chamber. ## Claims ### Claim 1 An actuator assembly to actuate a plasma tuning ring in a processing chamber, the actuator assembly comprising: an actuator arranged external to the processing chamber, the processing chamber being under vacuum, and the actuator being at atmospheric pressure; a rod coupled to the actuator and to the plasma tuning ring in the processing chamber; bellows arranged external to the processing chamber between the actuator and the processing chamber, the rod passing through the bellows into the processing chamber; and vacuum seals disposed between the bellows and the actuator and between the bellows and the processing chamber to seal the vacuum in the processing chamber from the atmospheric pressure external to the processing chamber. ### Claim 2 (depends on 1) The actuator assembly of claim 1 wherein the bellows comprise a polymer. ### Claim 3 (depends on 1) The actuator assembly of claim 1 wherein the vacuum seals do not obstruct movement of the rod through the bellows. ### Claim 4 (depends on 1) The actuator assembly of claim 1 wherein the vacuum seals comprise O-rings. ### Claim 5 (depends on 1) A system comprising the actuator assembly of claim 1 and further comprising: a substrate support arranged in the processing chamber to support a substrate, wherein the plasma tuning ring is arranged in the substrate support; an edge ring arranged proximate to the plasma tuning ring and around the substrate during substrate processing; and a temperature sensing assembly to sense temperature of the edge ring, the temperature sensing assembly comprising: a spring assembly arranged external to the processing chamber; second bellows arranged external to the processing chamber between the spring assembly and the processing chamber; and a temperature probe coupled to the spring assembly, the temperature probe passing through the second bellows and the plasma tuning ring, the spring assembly maintaining contact between the temperature probe and the edge ring. ### Claim 6 (depends on 5) The system of claim 5 wherein the second bellows comprise a polymer. ### Claim 7 (depends on 5) The system of claim 5 further comprising second vacuum seals disposed between the second bellows and the spring assembly and between the second bellows and the processing chamber to seal the vacuum in the processing chamber. ### Claim 8 (depends on 7) The system of claim 7 wherein the second vacuum seals do not obstruct movement of the temperature probe through the second bellows. ### Claim 9 (depends on 7) The system of claim 7 wherein the second vacuum seals comprise O-rings. ### Claim 10 (depends on 5) The system of claim 5 wherein the actuator is configured to move the plasma tuning ring away from the edge ring when the edge ring clamps to the substrate support. ### Claim 11 (depends on 5) The system of claim 5 wherein the actuator is configured to move the plasma tuning ring to contact the edge ring after the edge ring is clamped to the substrate support. ### Claim 12 (depends on 5) The system of claim 5 wherein the temperature probe moves with the plasma tuning ring when the actuator actuates the plasma tuning ring. ### Claim 13 (depends on 5) The system of claim 5 wherein the plasma tuning ring comprises an electrode to supply radio frequency power to the edge ring and wherein the actuator is configured to move the plasma tuning ring to maintain coupling between the plasma tuning ring and the edge ring during substrate processing. ### Claim 14 (depends on 5) The system of claim 5 wherein the temperature probe comprises a temperature sensor attached to an end of the temperature probe that is proximate to the plasma tuning ring and wherein the spring assembly is configured to maintain contact between the temperature sensor and the edge ring. ### Claim 15 (depends on 5) The system of claim 5 wherein the plasma tuning ring comprises an electrode to supply radio frequency power to the edge ring and wherein the temperature probe passes through the electrode to contact the edge ring. ### Claim 16 (depends on 5) The system of claim 5 wherein: the spring assembly comprises a spring disposed around a holder, the temperature probe passing through the holder; and a sealant disposed around the temperature probe, the sealant extending from the holder through the second bellows, the substrate support, and the plasma tuning ring to seal the vacuum in the processing chamber. ### Claim 17 (depends on 16) The system of claim 16 wherein the sealant comprises an epoxy material. ### Claim 18 (depends on 16) The system of claim 16 wherein the temperature sensing assembly further comprises a second seal disposed around the temperature probe in the plasma tuning ring to prevent erosion of the temperature probe and the sealant. ### Claim 19 (depends on 18) The system of claim 18 wherein the second seal comprises an O-ring. ### Claim 20 A system comprising: a substrate support arranged in a processing chamber under vacuum to support a substrate; an edge ring arranged around the substrate on the substrate support; a plasma tuning ring arranged adjacent to the edge ring in the substrate support; and an actuator assembly to actuate the plasma tuning ring, the actuator assembly comprising: an actuator coupled externally to the processing chamber, the actuator being at atmospheric pressure; a rod coupled to the actuator and to the plasma tuning ring; bellows arranged externally to the processing chamber between the actuator and the processing chamber, the rod passing through the bellows; and vacuum seals disposed between the bellows and the actuator and between the bellows and the processing chamber to seal the vacuum in the processing chamber from the atmospheric pressure external to the processing chamber. ### Claim 21 (depends on 20) The system of claim 20 wherein the vacuum seals do not obstruct movement of the rod through the bellows. ### Claim 22 (depends on 20) The system of claim 20 further comprising a temperature sensing assembly comprising: a spring assembly coupled externally to the processing chamber; second bellows arranged externally to the processing chamber between the spring assembly and the processing chamber; and a temperature probe coupled to the spring assembly, the temperature probe passing through the second bellows and the plasma tuning ring, the spring assembly maintaining contact between the temperature probe and the edge ring. ### Claim 23 (depends on 22) The system of claim 22 further comprising second vacuum seals disposed between the second bellows and the spring assembly and between the second bellows and the processing chamber to seal the vacuum in the processing chamber. ### Claim 24 (depends on 23) The system of claim 23 wherein the second vacuum seals do not obstruct movement of the temperature probe through the second bellows. ### Claim 25 (depends on 20) The system of claim 20 wherein the actuator is configured to move the plasma tuning ring away from the edge ring when the edge ring clamps to the substrate support. ### Claim 26 (depends on 20) The system of claim 20 wherein the actuator is configured to move the plasma tuning ring to contact the edge ring after the edge ring is clamped to the substrate support. ### Claim 27 (depends on 22) The system of claim 22 wherein the temperature probe moves with the plasma tuning ring when the actuator actuates the plasma tuning ring. ### Claim 28 (depends on 20) The system of claim 20 wherein the plasma tuning ring comprises an electrode to supply radio frequency power to the edge ring and wherein the actuator is configured to move the plasma tuning ring to maintain coupling between the plasma tuning ring and the edge ring during substrate processing. ### Claim 29 (depends on 22) The system of claim 22 wherein the temperature probe comprises a temperature sensor attached to an end of the temperature probe that is proximate to the plasma tuning ring and wherein the spring assembly is configured to maintain contact between the temperature sensor and the edge ring. ### Claim 30 (depends on 22) The system of claim 22 wherein the plasma tuning ring comprises an electrode to supply radio frequency power to the edge ring and wherein the temperature probe passes through the electrode to contact the edge ring.