Automated chemical switching for material delayering

A method comprising:

• delayering, at a first time, a multilayered material until a first endpoint condition is satisfied, the delayering at the first time using at least a charged particle source and a gas source according to a first delayering setting, the first delayering setting controlling an energy of a charged particle beam emitted by the charged particle source and/or a first gas composition released by the gas source;
• determining a change to the delayering setting based on the first endpoint condition being satisfied, the change being to at least the first gas composition and resulting in a second delayering setting;
• and
• delayering, at a second time subsequent to the first time, the multilayered material until a second endpoint condition is satisfied, the delayering at the second time using at least the charged particle source and/or a second gas source according to the second delayering setting.

A non-transitory computer-readable medium embodying program code comprising instructions which, when executed by a processor, cause the processor to perform operations comprising:

• delayering, at a first time, a multilayered material until a first endpoint condition is satisfied, the delayering at the first time using at least a charged particle source and a gas source according to a first delayering setting, the first delayering setting controlling an energy of a charged particle beam emitted by the charged particle source or a gas composition released by the gas source;
• determining a change to the delayering setting based on the first endpoint condition being satisfied, the change being to at least the gas composition and resulting in a second delayering setting;
• and
• delayering, at a second time subsequent to the first time, the multilayered material until a second endpoint condition is satisfied, the delayering at the second time using at least the charged particle source and the gas source according to the second delayering setting.