Method for producing a mirror substrate of an optical element, optical element and projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsAndreas NITTKE, Klaus SCHEULEN
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Abstract
A method for producing a mirror substrate of an optical element for a projection exposure apparatus, in particular an EUV projection exposure apparatus, comprising a first and at least one second component, wherein the first component and the at least one second component consist of silicon at least on a side facing a connection, and the method includes the following steps: providing/producing the at least two components of the mirror substrate and joining the at least two components by heating to a joining temperature and applying a joining pressure, preferably perpendicular to a joining surface.
Claims20
A method for producing a mirror substrate of an optical element for a projection exposure apparatus comprising:
- providing a first component and at least one second component, wherein the first component and the at least one second component consist of silicon at least on a side facing a connection;
- joining the first component and the at least one second component by heating the first component and the at least one second component to a joining temperature and applying a joining pressure to the first component and the at least one second component.
Dependencies are inferred from the claim text.