Processing apparatus, processing method and processing system
AssigneeNikon Corporation
InventorsMasayuki SHIRAISHI, Kenta Sudo, Yosuke Tatsuzaki, Baku Ogasawara
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Abstract
A processing apparatus is a processing apparatus that irradiates a surface of an object with processing light to process an object and is provided with: a light irradiation apparatus that emits first processing light to form a first irradiation area on the surface and emits second processing light to form a second irradiation area, at least a part of which overlaps with the first irradiation area, on the surface, and has a change member that is configured to change a state of an overlap between the first and second irradiation areas.
Claims22
A processing method comprising:
- obtaining pattern information that is related to a pattern structure, which extends along an extension direction on a surface of an object, and that is generated from a simulation model for simulating the object on which the pattern structure is formed;
- and
- processing the object by irradiating the object with processing light to form the pattern structure that extends along the extension direction based on the pattern object that includes information related to the extension direction.
A processing method comprising:
- obtaining pattern information that is related to a riblet structure, which extends along an extension direction on a surface of an object and by which a resistance to a fluid is reducible, and that is generated from a simulation model for simulating the object on which the riblet structure is formed;
- and
- processing the object by irradiating the object with processing light to form the riblet structure that extends along the extension direction based on the pattern object that includes information related to the extension direction.
Dependencies are inferred from the claim text.