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US 2026/0097415 A1Published application
Advanced dip-coating equipment and dip-coating method using the same
AssigneeKorea Institute of Energy Technology
InventorsHyo Won KIM, Nam Gyu LIM
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Abstract
The present disclosure relates to an advanced dip-coating apparatus and a dip-coating method using the same. More specifically, the present disclosure relates to an advanced dip-coating technology that prevents meniscus formation, inhibits infiltration into pores inside of a support, forms a thin film having a uniform thickness and provides a defect-free dense thin film coating layer by controlling the three parameters of coating solution viscosity, substrate withdrawing rate and air spinning flow rate.
Claims17
A dip-coating apparatus comprising:
- a solution tank in which a coating solution is stored;
- a substrate-providing unit configured to dip a substrate in the coating solution and to withdraw the substrate out of the coating solution;
- an air-discharging unit configured to supply air to the substrate at a constant flow rate when the dipped substrate is lifted up;
- and
- a rate-controlling unit configured to control the substrate dipping rate and withdrawing rate,
- wherein the substrate-providing unit comprises a tubular body configured to fix the substrate and to locate the substrate in the solution tank,
- the air-discharging unit comprises a discharging tube through which air is discharged to the outside,
- the discharging tube is linked with an air compressor through a tube, and
- the rate-controlling unit is installed to be linked with the substrate-providing unit and is an automated device configured to insert the substrate to the solution tank at a constant rate, to allow the substrate to be dipped in the coating solution for a predetermined time and to withdraw the substrate out of the solution tank at a constant rate to be located at its original position.
6 more elements
Dependencies are inferred from the claim text.