Soft X-Ray Tools for Semiconductor Metrology Applications
AssigneeyTools Inc.
InventorWilliam A. Schumaker
Life of this patent
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Abstract
An optical system for conditioning a source beam in the soft X-ray range. The optical system is positioned and configured with a geometry to redirect a selected portion of the source beam for illuminating a semiconductor substrate at a specific angle of incidence. The optical system includes at least two optical elements. A first optical element reflects the selected portion of the source beam having a specified wavelength. The second optical element then reflects and focuses the selected portion as a target beam onto the semiconductor substrate.
Claims24
An optical system for use in a metrology system to evaluate nanoscale features formed in a semiconductor substrate, comprising:
- a plurality of optics having a geometric arrangement configured to create, from an incoming source beam in the soft-X-ray range, a target beam having a defined spectral, spatial, and angular distribution, the plurality of optics positioned for illuminating the semiconductor substrate with the target beam at a specified angle of incidence.
An optical system for conditioning a source beam in the soft X-ray range for use in a metrology system to evaluate nanoscale features formed in a semiconductor substrate, comprising:
- at least two optics, including a first optic positioned to receive the source beam and configured to reflect a first beam portion of the source beam having a specific wavelength, and a second optic positioned to receive the first beam portion and configured to reflect and focus the first beam portion as a target beam onto a target point on the semiconductor substrate;
- wherein the geometry and positions of the first optic and the second optic are set to illuminate the target point at a given angle of incidence;
- and wherein light from the target beam is reflected and scattered off the semiconductor substrate and is collected and used to characterize the nanoscale features.
A tool for semiconductor metrology, the tool is coupled to a light source that provides a source beam in the soft X-ray range, comprising:
- a platform holding and positioning a semiconductor substrate;
- an optical system configured to redirect a portion of the source beam toward the semiconductor substrate at a specific angle of incidence, the optical system including at least two optical elements, including a first optical element configured to receive the source beam and to reflect a portion of the source beam having a specified wavelength, and a second optical element configured to receive the reflected portion of the source beam and to reflect and focus the reflected portion as a target beam onto the semiconductor substrate;
- and
- a detector positioned to receive and process light from the target beam that is reflected and scattered from the nanoscale features of the semiconductor substrate.
A tool for semiconductor metrology used to evaluate nanoscale features formed in a semiconductor substrate, the tool is coupled to a light source that provides a source beam in the soft X-ray range as input to the tool, comprising:
- a platform holding and positioning a semiconductor substrate;
- a detector positioned to receive and process light that is reflected and scattered from the nanoscale features of the semiconductor substrate;
- and
- an optical system configured to redirect a portion of the source beam toward the semiconductor substrate at a specific angle of incidence, the optical system including:
- a monochromator positioned in the beamline to separate wavelengths of the input beam;
- a polarizer positioned between the monochromator and the first optical element and configured to impart a desired polarization to the input beam;
- a wavelength selecting optic configured to receive the input beam and to reflect the portion of the input beam having a specific wavelength, and
- a focusing optic configured to receive the reflected portion of the input beam and to reflect and focus the reflected portion as a target beam onto the semiconductor substrate;
- wherein the specific angle of incidence is set by the positioning and orientation of the wavelength selecting optic and the focusing optic.
Dependencies are inferred from the claim text.