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US 2026/0092354 A1Published application
Method of quality determining of deposition mask, method of manufacturing deposition mask, method of manufacturing deposition mask device, method of selecting deposition mask, and deposition mask
AssigneeDai Nippon Printing Co., Ltd.
InventorChikao IKENAGA
Life of this patent
Estimating the term…
Abstract
A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
Claims15
A method of quality determination of a deposition mask for determining a quality of a deposition mask extending in a first direction, the deposition mask comprising:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- the method comprising:
- a measuring step that measures a dimension X1 from the P1 point to the Q1 point, and a dimension X2 from the P2 point to the Q2 point;
- and
- a determining step that determines a quality of the deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
5 more elements
A method of manufacturing a deposition mask extending in a first direction, the method comprising:
- a step of supplying an elongated metal plate extending in a strip shape;
- a step of etching the metal plate by a photolithographic technique to form a first recess in the metal plate from a first surface side;
- and
- a step of etching the metal plate by the photolithography technique to form a second recess in the metal plate from the second surface side,
- the deposition mask comprises:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction,
- wherein the deposition mask satisfies an equation below:
- ❘
- "\[LeftBracketingBar]"
- α
- X
- -
- X
-
- 1
- +
- X
-
- 2
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 5
- ×
- 1
-
- 0
- -
- 3
- in which X1 represents a dimension from the P1 point to the Q1 point, X2 represents a dimension from the P2 point to the Q2 point, and αX represents a design value of the dimension X1 and the dimension X2.
35 more elements
A method of manufacturing a deposition mask extending in a first direction, the method comprising:
- a step of supplying an elongated metal plate extending in a strip shape;
- a step of etching the metal plate by a photolithographic technique to form a first recess in the metal plate from a first surface side;
- and
- a step of etching the metal plate by the photolithography technique to form a second recess in the metal plate from the second surface side,
- the deposition mask comprises:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a plurality of through holes formed by communicating the first recess and the second recess with each other,
- wherein the deposition mask satisfies an equation below:
- ❘
- "\[LeftBracketingBar]"
- X
-
- 1
- -
- X
-
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 0
- ×
- α
- Y
- W
- Y
- ×
- 1
-
- 0
- -
- 3
- in which X1 represents a dimension from the P1 point to the Q1 point, X2 represents a dimension from the P2 point to the Q2 point, αX represents a design value of the dimension X1 and the dimension X2, αY represents a design value of a dimension from the P1 point to the P2 point and a dimension from the Q1 point to the Q2 point, and WY represents a maximum value of a distance between center points of two through holes in the second direction.
37 more elements
A method of selecting a deposition mask extending in a first direction, the deposition mask comprising:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- the method comprising:
- a measuring step that measures a dimension X1 from the P1 point to the Q1 point, and a dimension X2 from the P2 point to the Q2 point;
- and
- a selecting step that selects the deposition mask wherein the dimension X1 and the dimension X2 measured in the measuring step satisfy an equation below:
- ❘
- "\[LeftBracketingBar]"
- α
- X
- -
- X
-
- 1
- +
- X
-
- 2
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 5
- ×
- 1
-
- 0
- -
- 3
- in which αX represents a design value of the dimension X1 and the dimension X2.
33 more elements
A method of selecting a deposition mask extending in a first direction and having a plurality of through holes, the deposition mask comprising:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- the method comprising:
- a measuring step that measures a dimension X1 from the P1 point to the Q1 point, and a dimension X2 from the P2 point to the Q2 point;
- and
- a selecting step that selects the deposition mask wherein the dimension X1 and the dimension X2 measured in the measuring step satisfy an equation below:
- ❘
- "\[LeftBracketingBar]"
- X
-
- 1
- -
- X
-
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 0
- ×
- α
- Y
- W
- Y
- ×
- 1
-
- 0
- -
- 3
- in which αX represents a design value of the dimension X1 and the dimension X2, αY represents a design value of a dimension from the P1 point to the P2 point and a dimension from the Q1 point to the Q2 point, and WY represents a maximum value of a distance between center points of two through holes in the second direction.
34 more elements
A deposition mask extending in a first direction, comprising:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- wherein the deposition mask satisfies an equation below:
- ❘
- "\[LeftBracketingBar]"
- α
- X
- -
- X
-
- 1
- +
- X
-
- 2
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 5
- ×
- 1
-
- 0
- -
- 3
- in which X1 represents a dimension from the P1 point to the Q1 point, X2 represents a dimension from the P2 point to the Q2 point, and αX represents a design value of the dimension X1 and the dimension X2.
30 more elements
A deposition mask extending in a first direction and having a plurality of through holes, comprising:
- a first center axis line that extends in the first direction and is arranged at a center position of a second direction orthogonal to the first direction;
- a P1 point and a Q1 point that are provided on one side of the first center axis line and are spaced apart from each other along the first direction;
- and
- a P2 point and a Q2 point that are provided on the other side of the first center axis line and are spaced apart from each other along the first direction;
- wherein the deposition mask satisfies an equation below:
- ❘
- "\[LeftBracketingBar]"
- X
-
- 1
- -
- X
-
- 2
- ❘
- "\[RightBracketingBar]"
- ≤
- α
- X
- 1
-
- 0
- ×
- α
- Y
- W
- Y
- ×
- 1
-
- 0
- -
- 3
- in which X1 represents a dimension from the P1 point to the Q1 point, X2 represents a dimension from the P2 point to the Q2 point, αX represents a design value of the dimension X1 and the dimension X2, αY represents a design value of a dimension from the P1 point to the P2 point and a dimension from the Q1 point to the Q2 point, and WY represents a maximum value of a distance between center points of two through holes in the second direction.
31 more elements
Dependencies are inferred from the claim text.