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US 2026/0092212 A1Published application
Selective etch inhibitor compounds and related methods
AssigneeEntegris, Inc.
InventorsThomas Doundoulakis, Steven A. Lippy
Life of this patent
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Abstract
Selective etch inhibitor compounds and related methods are provided. A method comprises obtaining a composition comprising an inhibitor compound; and selectively etching silicon nitride from a structure comprising silicon nitride. A composition comprises a phosphoric acid compound, an alkyl ammonium silicate compound, and 1% to 25% by weight of an inhibitor compound based on a total weight of the composition.
Claims20
A composition comprising:
- an inhibitor compound of the formula:
- where:
- R is independently an alkoxy or a hydroxyl;
- n is at least 1;
- and
- Y is a group of the formula:
- where:
- R1 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl;
- and
- R2 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl,
- R3 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl, or
- R2 and R3 are bonded to each other to form a carbocycle or a heterocycle.
9 more elements
A composition comprising:
- a phosphoric acid compound;
- an alkyl ammonium silicate compound;
- and
- 1% to 25% by weight of an inhibitor compound based on a total weight of the composition,
- wherein the inhibitor compound comprises a compound of the formula:
- where:
- R is independently an alkoxy or a hydroxyl;
- n is at least 1;
- and
- Y is a group of the formula:
- where:
- R1 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl;
- and
- R2 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl,
- R3 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl, or
- R2 and R3 are bonded to each other to form a carbocycle or a heterocycle.
13 more elements
A method comprising:
- obtaining a composition comprising an inhibitor compound of the formula:
- where:
- R is independently an alkoxy or a hydroxyl;
- n is at least 1;
- and
- Y is a group of the formula:
- where:
- R1 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl;
- and
- R2 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl,
- R3 is a hydrogen, an alkyl, a cycloalkyl, an aryl, an aralkyl, a silylalkyl, or an aminoalkyl, or
- R2 and R3 are bonded to each other to form a carbocycle or a heterocycle;
- selectively etching silicon nitride from a structure comprising silicon nitride.
10 more elements
Dependencies are inferred from the claim text.