Substrate processing device and method for removing bubbles from filter
AssigneeSCREEN Holdings Co., Ltd.
InventorsYuya TSUCHIHASHI, Hidekazu ISHIKAWA, Sadamu FUJII, Pohling THEN, Takashi NAGAO
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AssigneeSCREEN Holdings Co., Ltd.
InventorsYuya TSUCHIHASHI, Hidekazu ISHIKAWA, Sadamu FUJII, Pohling THEN, Takashi NAGAO
Estimating the term…
A substrate processing apparatus is provided with a substrate processor a piping, a filter, an upstream-side piping, a downstream-side piping, and a removing liquid supply. The substrate processor processes a substrate W. The piping allows a processing liquid to flow therethrough toward the substrate processor. The filter is disposed in the piping. The upstream-side piping is connected to the piping at the upstream side of the filter. The downstream-side piping is connected to the piping at the downstream side of the filter. The removing liquid supply supplies a bubble removing liquid to one of the upstream-side piping and the downstream-side piping. The substrate processing apparatus allows the bubble removing liquid to pass from the one of the upstream-side piping and the downstream-side piping via the filter to the other of the upstream-side piping and the downstream-side piping.
A substrate processing apparatus comprising:
A method of removing bubbles from a filter comprising:
Dependencies are inferred from the claim text.