# US 2026/0090337 A1 · Machine learning based virtual sensing of wafer temperatures during reflow process in a physical vapor deposition chamber with uncertain chamber physical properties and varying operating conditions

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- Number: US 2026/0090337 A1
- Document ID: US20260090337A1
- Status: Published application
- Kind: A1
- Application number: 18/890,876
- Filed: 2024-09-20
- Published: 2026-03-26
- Earliest claimed: 2024-09-20
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: Preetham RAO; Suhas UMESH; Martin Lee RIKER; Fuhong ZHANG; Kishor KALATHIPARAMBIL
- Web page: https://patentgrep.com/patent/US20260090337A1

## CPC

- H10P 74/238: {comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement}
- G01K 3/10: in respect of time, e.g. reacting only to a quick change of temperature
- G01K 3/14: in respect of space
- G05B 13/0265: {the criterion being a learning criterion}
- G01K 2213/00: Temperature mapping
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- G01K: MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR (radiation pyrometry G01J5/00)
- G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables G05D; systems for regulating electric or magnetic variables G05F; control devices or systems insofar as characterised by mechanical features only G05G)

## Abstract

Methods and devices for determining a temperature of a substrate during processing are provided herein. Embodiments include extracting modes from a virtual model of thermal conditions within a processing chamber. Embodiments further include receiving thermal sensor data associated with a target substrate. Embodiments further include using compressed sensing to generate a thermal map for the target substrate based on the thermal sensor data and the extracted modes.

## Claims

### Claim 1

A method for determining a temperature of a substrate during processing, comprising:
extracting modes from a virtual model of thermal conditions within a processing chamber;
receiving thermal sensor data associated with a target substrate; and
using compressed sensing to generate a thermal map for the target substrate based on the thermal sensor data and the extracted modes.

### Claim 2 (depends on 1)

The method of claim 1, further comprising performing, based on the generated thermal map, one or more of:
adjusting a position of a substrate support within the processing chamber;
adjusting heating components within the processing chamber;
adjusting other components of the processing chamber; or
discarding a processed substrate.

### Claim 3 (depends on 1)

The method of claim 1, wherein extracting the modes is based on using proper orthogonal decomposition.

### Claim 4 (depends on 1)

The method of claim 1, wherein the modes are extracted using a neural network.

### Claim 5 (depends on 1)

The method of claim 1, wherein the virtual model is created based on measuring temperature values associated with substrate processing.

### Claim 6 (depends on 1)

The method of claim 1, wherein extracting the modes is based on providing a position of the target substrate as an input to the virtual model, wherein the modes are based on the position.

### Claim 7 (depends on 1)

The method of claim 1, wherein the virtual model is created based on temperature measurements associated with multiple processing recipes.

### Claim 8 (depends on 1)

The method of claim 1, wherein the thermal sensor data comprises a temperature measurement as a function of time.

### Claim 9 (depends on 1)

The method of claim 1, wherein the thermal sensor data comprises temperature measurements from multiple sensors.

### Claim 10 (depends on 9)

The method of claim 9, wherein one of the sensors measures a temperature of a component associated with the processing chamber.

### Claim 11

A method for determining a temperature of a substrate during processing, comprising:
using proper orthogonal decomposition to extract modes from a virtual model of thermal conditions within a processing chamber, wherein the virtual model is created based on measuring temperature values associated with substrate processing, wherein a position of a target substrate is provided as an input to the virtual model;
receiving thermal sensor data associated with the target substrate, wherein the thermal sensor data comprises a temperature measurement as a function of time;
generating a thermal map for the target substrate based providing the thermal sensor data and the extracted modes as inputs to a compressed sensing algorithm; and
performing one or more actions relating to processing substrates based on the thermal map.

### Claim 12

A computer readable medium, storing instructions that when executed by a processor of a system, cause the system to:
extract modes from a virtual model of thermal conditions within a processing chamber;
receive thermal sensor data associated with a target substrate; and
use compressed sensing to generate a thermal map for the target substrate
based on the thermal sensor data and the extracted modes.

### Claim 13 (depends on 12)

The computer readable medium of claim 12, further comprising performing, based on the generated thermal map, one or more of:
adjusting a position of a substrate support within the processing chamber;
adjusting heating components within the processing chamber;
adjusting other components of the processing chamber; or
discarding a processed substrate.

### Claim 14 (depends on 12)

The computer readable medium of claim 12, wherein extracting the modes is based on using proper orthogonal decomposition.

### Claim 15 (depends on 12)

The computer readable medium of claim 12, wherein the modes are extracted using a neural network.

### Claim 16 (depends on 12)

The computer readable medium of claim 12, wherein the virtual model is created based on measuring temperature values associated with substrate processing.

### Claim 17 (depends on 12)

The computer readable medium of claim 12, wherein extracting the modes is based on providing a position of the target substrate as an input to the virtual model, wherein the modes are based on the position.

### Claim 18 (depends on 12)

The computer readable medium of claim 12, wherein the thermal sensor data comprises a temperature measurement as a function of time.

### Claim 19 (depends on 12)

The computer readable medium of claim 12, wherein the thermal sensor data comprises temperature measurements from multiple sensors.

### Claim 20 (depends on 19)

The computer readable medium of claim 19, wherein one of the sensors measures a temperature of a component associated with the processing chamber.
