System for the Simultaneous Monitoring of Constituents of an Electroplating Bath

A device designed to monitor the concentrations of the constituents of a plating bath during an electrometallization process, the device comprising:

• (a) a personal computer;
• (b) a real time electrochemical analyzer comprising
• (1) a comprehensive electrochemical controller
• (I) a potentiostat;
• (II) a consolidated designer waveform generator designed to create a consolidated designer waveform comprised of segments having both AC and DC components;
• and
• (III) a data acquisition module;
• and
• (2) an electrochemical probe comprising
• (I) an electrochemical sensor comprising an inner compartment;
• and
• (II) a pump;
• and
• (c) a plating bath comprised of constituents that fill the inner compartment of the multi-task electrochemical probe;
• wherein the real time electrochemical analyzer analyzes the plating bath constituents using an electroanalysis process is Alternating Current Voltammetry (ACV).